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Show new changes starting from 20:45, 26 March 2017
   

23 March 2017

     12:47  Resources/Selected Readings‎ (diff | hist) . . (+130). . Admin (talk | contribs)
N    08:26  Talk:Main Page‎‎ (2 changes | history) . . (0). . [8.41.202.200‎ (2×)]
      08:26 (cur | prev) . . (-4). . 8.41.202.200 (talk) (Blanked the page)
N     08:26 (cur | prev) . . (+4). . 8.41.202.200 (talk) (Created page with "poop")

22 March 2017

N    21:50  Wet etching‎‎ (2 changes | history) . . (+2,114). . [Admin‎ (2×)]
      21:50 (cur | prev) . . (+26). . Admin (talk | contribs)
N     21:49 (cur | prev) . . (+2,088). . Admin (talk | contribs) (Created page with "== Etching Silicon Dioxide == SiO2 can be wet etched in a home chip lab environment easily with ~2% HF from Whink Rust Stain remover, which can be purchased on amazon. It can...")

21 March 2017

     14:02  Resources/Selected Readings‎ (diff | hist) . . (+79). . Admin (talk | contribs)
N    14:02  Photolithography‎‎ (4 changes | history) . . (+2,929). . [Admin‎ (4×)]
      14:02 (cur | prev) . . (+1,429). . Admin (talk | contribs)
      13:58 (cur | prev) . . (-2). . Admin (talk | contribs)
      13:58 (cur | prev) . . (+1,374). . Admin (talk | contribs)
N     13:48 (cur | prev) . . (+128). . Admin (talk | contribs) (Created page with "<html><iframe width="560" height="315" src="https://www.youtube.com/embed/XVoldtNpIzI" frameborder="0" allowfullscreen></iframe>")

20 March 2017

N    21:53  RCA clean‎ (diff | hist) . . (+1,288). . Admin (talk | contribs) (Created page with ""The RCA clean is a standard set of wafer cleaning steps which need to be performed before high-temperature processing steps (oxidation, diffusion, CVD) of silicon wafers in s...")
N    21:42  Piranha solution‎‎ (2 changes | history) . . (+822). . [Admin‎ (2×)]
      21:42 (cur | prev) . . (+28). . Admin (talk | contribs)
N     21:25 (cur | prev) . . (+794). . Admin (talk | contribs) (Created page with "The Piranha solution is used to clean organic contamination off of silicon wafers prior to processing. This is usually the first of many chemical cleans and is often followed...")