Most furnace anneals do not really have their place in a home chip lab, because they are mostly only needed after processes such as ion implantation to "activate" the dopant atoms, i.e. force them into actual locations in the Silicon lattice rather than being interstitial. These anneals can be done in a rapid thermal process (RTP) or with the same types of furnaces used for Thermal oxidation
Does anyone know if it would be possible to thermally evaporate amorphous Silicon then locally laser anneal it to be polysilicon as to make a variant of the Silicon Gate Technology process that could be done without the use of Silane gas for standard chemical vapor deposition of polysilicon? Please let me (Sam) know. Thanks.